Thermal stability of (HfO2)x(Al2O 3)1-x on Si
10.1063/1.1519733
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sg-nus-scholar.10635-831922023-10-25T22:57:31Z Thermal stability of (HfO2)x(Al2O 3)1-x on Si Yu, H.Y. Wu, N. Li, M.F. Zhu, C. Cho, B.J. Kwong, D.-L. Tung, C.H. Pan, J.S. Chai, J.W. Wang, W.D. Chi, D.Z. Ang, C.H. Zheng, J.Z. Ramanathan, S. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1519733 Applied Physics Letters 81 19 3618-3620 APPLA 2014-10-07T04:38:22Z 2014-10-07T04:38:22Z 2002-11-04 Article Yu, H.Y., Wu, N., Li, M.F., Zhu, C., Cho, B.J., Kwong, D.-L., Tung, C.H., Pan, J.S., Chai, J.W., Wang, W.D., Chi, D.Z., Ang, C.H., Zheng, J.Z., Ramanathan, S. (2002-11-04). Thermal stability of (HfO2)x(Al2O 3)1-x on Si. Applied Physics Letters 81 (19) : 3618-3620. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1519733 00036951 http://scholarbank.nus.edu.sg/handle/10635/83192 000178935200034 Scopus |
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10.1063/1.1519733 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Yu, H.Y. Wu, N. Li, M.F. Zhu, C. Cho, B.J. Kwong, D.-L. Tung, C.H. Pan, J.S. Chai, J.W. Wang, W.D. Chi, D.Z. Ang, C.H. Zheng, J.Z. Ramanathan, S. |
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Article |
author |
Yu, H.Y. Wu, N. Li, M.F. Zhu, C. Cho, B.J. Kwong, D.-L. Tung, C.H. Pan, J.S. Chai, J.W. Wang, W.D. Chi, D.Z. Ang, C.H. Zheng, J.Z. Ramanathan, S. |
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Yu, H.Y. Wu, N. Li, M.F. Zhu, C. Cho, B.J. Kwong, D.-L. Tung, C.H. Pan, J.S. Chai, J.W. Wang, W.D. Chi, D.Z. Ang, C.H. Zheng, J.Z. Ramanathan, S. Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
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Yu, H.Y. |
title |
Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
title_short |
Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
title_full |
Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
title_fullStr |
Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
title_full_unstemmed |
Thermal stability of (HfO2)x(Al2O 3)1-x on Si |
title_sort |
thermal stability of (hfo2)x(al2o 3)1-x on si |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/83192 |
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1781784324219076608 |