Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film

10.1016/j.tsf.2004.05.121

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Bibliographic Details
Main Authors:	Balasubramanian, M., Bera, L.K., Mathew, S., Balasubramanian, N., Lim, V., Joo, M.S., Cho, B.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Gate dielectrics HfO2 High-K Wet etching
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83265
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83265
record_format	dspace
spelling	sg-nus-scholar.10635-832652024-11-14T01:25:05Z Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film Balasubramanian, M. Bera, L.K. Mathew, S. Balasubramanian, N. Lim, V. Joo, M.S. Cho, B.J. ELECTRICAL & COMPUTER ENGINEERING Gate dielectrics HfO2 High-K Wet etching 10.1016/j.tsf.2004.05.121 Thin Solid Films 462-463 SPEC. ISS. 101-105 THSFA 2014-10-07T04:39:14Z 2014-10-07T04:39:14Z 2004-09 Article Balasubramanian, M., Bera, L.K., Mathew, S., Balasubramanian, N., Lim, V., Joo, M.S., Cho, B.J. (2004-09). Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film. Thin Solid Films 462-463 (SPEC. ISS.) : 101-105. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.05.121 00406090 http://scholarbank.nus.edu.sg/handle/10635/83265 000223812800022 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Gate dielectrics HfO2 High-K Wet etching
spellingShingle	Gate dielectrics HfO2 High-K Wet etching Balasubramanian, M. Bera, L.K. Mathew, S. Balasubramanian, N. Lim, V. Joo, M.S. Cho, B.J. Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
description	10.1016/j.tsf.2004.05.121
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Balasubramanian, M. Bera, L.K. Mathew, S. Balasubramanian, N. Lim, V. Joo, M.S. Cho, B.J.
format	Article
author	Balasubramanian, M. Bera, L.K. Mathew, S. Balasubramanian, N. Lim, V. Joo, M.S. Cho, B.J.
author_sort	Balasubramanian, M.
title	Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
title_short	Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
title_full	Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
title_fullStr	Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
title_full_unstemmed	Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
title_sort	wet etching characteristics and surface morphology evaluation of mocvd grown hfo2 film
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83265
_version_	1821208921808830464

Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film

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