Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film
10.1016/j.tsf.2004.05.121
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Main Authors: | Balasubramanian, M., Bera, L.K., Mathew, S., Balasubramanian, N., Lim, V., Joo, M.S., Cho, B.J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83265 |
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Institution: | National University of Singapore |
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