Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process
10.1109/LED.2006.882569
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| التنسيق: | مقال |
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2014
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| الوصول للمادة أونلاين: | http://scholarbank.nus.edu.sg/handle/10635/83280 |
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| المؤسسة: | National University of Singapore |
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sg-nus-scholar.10635-832802024-11-11T07:32:37Z Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process Ren, C. Chan, D.S.H. Loh, W.Y. Balakumar, S. Du, A.Y. Tung, C.H. Lo, G.Q. Kumar, R. Balasubramanian, N. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CMOS Dual work function (WF) Gate first Intermixing (InM) Metal gate 10.1109/LED.2006.882569 IEEE Electron Device Letters 27 10 811-813 EDLED 2014-10-07T04:39:27Z 2014-10-07T04:39:27Z 2006 Article Ren, C., Chan, D.S.H., Loh, W.Y., Balakumar, S., Du, A.Y., Tung, C.H., Lo, G.Q., Kumar, R., Balasubramanian, N., Kwong, D.-L. (2006). Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process. IEEE Electron Device Letters 27 (10) : 811-813. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2006.882569 07413106 http://scholarbank.nus.edu.sg/handle/10635/83280 000240925900007 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
CMOS Dual work function (WF) Gate first Intermixing (InM) Metal gate |
| spellingShingle |
CMOS Dual work function (WF) Gate first Intermixing (InM) Metal gate Ren, C. Chan, D.S.H. Loh, W.Y. Balakumar, S. Du, A.Y. Tung, C.H. Lo, G.Q. Kumar, R. Balasubramanian, N. Kwong, D.-L. Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| description |
10.1109/LED.2006.882569 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ren, C. Chan, D.S.H. Loh, W.Y. Balakumar, S. Du, A.Y. Tung, C.H. Lo, G.Q. Kumar, R. Balasubramanian, N. Kwong, D.-L. |
| format |
Article |
| author |
Ren, C. Chan, D.S.H. Loh, W.Y. Balakumar, S. Du, A.Y. Tung, C.H. Lo, G.Q. Kumar, R. Balasubramanian, N. Kwong, D.-L. |
| author_sort |
Ren, C. |
| title |
Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| title_short |
Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| title_full |
Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| title_fullStr |
Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| title_full_unstemmed |
Work-function tuning of TaN by high-temperature metal intermixing technique for gate-first CMOS process |
| title_sort |
work-function tuning of tan by high-temperature metal intermixing technique for gate-first cmos process |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83280 |
| _version_ |
1821209764258906112 |