A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance

A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance

2005 International Semiconductor Device Research Symposium

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Main Authors: Wang, X.P., Li, M.F., Chin, A., Zhu, C., Chi, R., Yu, X.F., Shen, C., Du, A.Y., Chan, D.S.H., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83380
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-833802015-02-02T11:12:14Z A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance Wang, X.P. Li, M.F. Chin, A. Zhu, C. Chi, R. Yu, X.F. Shen, C. Du, A.Y. Chan, D.S.H. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 2005 International Semiconductor Device Research Symposium 2005 242-243 2014-10-07T04:40:34Z 2014-10-07T04:40:34Z 2005 Conference Paper Wang, X.P.,Li, M.F.,Chin, A.,Zhu, C.,Chi, R.,Yu, X.F.,Shen, C.,Du, A.Y.,Chan, D.S.H.,Kwong, D.-L. (2005). A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance. 2005 International Semiconductor Device Research Symposium 2005 : 242-243. ScholarBank@NUS Repository. 1424400848 http://scholarbank.nus.edu.sg/handle/10635/83380 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 2005 International Semiconductor Device Research Symposium
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Wang, X.P.
Li, M.F.
Chin, A.
Zhu, C.
Chi, R.
Yu, X.F.
Shen, C.
Du, A.Y.
Chan, D.S.H.
Kwong, D.-L.
format Conference or Workshop Item
author Wang, X.P.
Li, M.F.
Chin, A.
Zhu, C.
Chi, R.
Yu, X.F.
Shen, C.
Du, A.Y.
Chan, D.S.H.
Kwong, D.-L.
spellingShingle Wang, X.P.
Li, M.F.
Chin, A.
Zhu, C.
Chi, R.
Yu, X.F.
Shen, C.
Du, A.Y.
Chan, D.S.H.
Kwong, D.-L.
A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
author_sort Wang, X.P.
title A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
title_short A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
title_full A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
title_fullStr A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
title_full_unstemmed A new gate dielectric HfLaO with metal gate work function tuning capability and superior NMOSFETs performance
title_sort new gate dielectric hflao with metal gate work function tuning capability and superior nmosfets performance
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83380
_version_ 1681089425237344256

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