AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process
10.1109/VLSI-TSA.2012.6210119
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sg-nus-scholar.10635-834502015-01-16T08:04:04Z AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process Liu, X. Zhan, C. Chan, K.W. Liu, W. Tan, L.S. Teo, K.L. Chen, K.J. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/VLSI-TSA.2012.6210119 International Symposium on VLSI Technology, Systems, and Applications, Proceedings - 2014-10-07T04:41:22Z 2014-10-07T04:41:22Z 2012 Conference Paper Liu, X.,Zhan, C.,Chan, K.W.,Liu, W.,Tan, L.S.,Teo, K.L.,Chen, K.J.,Yeo, Y.-C. (2012). AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process. International Symposium on VLSI Technology, Systems, and Applications, Proceedings : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/VLSI-TSA.2012.6210119" target="_blank">https://doi.org/10.1109/VLSI-TSA.2012.6210119</a> 9781457720840 19308868 http://scholarbank.nus.edu.sg/handle/10635/83450 NOT_IN_WOS Scopus |
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10.1109/VLSI-TSA.2012.6210119 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Liu, X. Zhan, C. Chan, K.W. Liu, W. Tan, L.S. Teo, K.L. Chen, K.J. Yeo, Y.-C. |
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Conference or Workshop Item |
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Liu, X. Zhan, C. Chan, K.W. Liu, W. Tan, L.S. Teo, K.L. Chen, K.J. Yeo, Y.-C. |
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Liu, X. Zhan, C. Chan, K.W. Liu, W. Tan, L.S. Teo, K.L. Chen, K.J. Yeo, Y.-C. AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
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Liu, X. |
title |
AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
title_short |
AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
title_full |
AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
title_fullStr |
AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
title_full_unstemmed |
AlGaN/GaN-on-silicon MOS-HEMTs with breakdown voltage of 800 V and on-state resistance of 3 mΩ.cm 2 using a CMOS-compatible gold-free process |
title_sort |
algan/gan-on-silicon mos-hemts with breakdown voltage of 800 v and on-state resistance of 3 mω.cm 2 using a cmos-compatible gold-free process |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83450 |
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