CMOS compatible Ge/Si core/shell nanowire gate-all-around pMOSFET integrated with HfO2/TaN gate stack

CMOS compatible Ge/Si core/shell nanowire gate-all-around pMOSFET integrated with HfO2/TaN gate stack

10.1109/IEDM.2009.5424284

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Bibliographic Details
Main Authors: Peng, J.W., Singh, N., Lo, G.Q., Kwong, D.L., Lee, S.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83550
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Institution: National University of Singapore
Description
Summary:10.1109/IEDM.2009.5424284

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