Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric

10.1109/.2005.1469207

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Bibliographic Details
Main Authors:	Park, C.S., Cho, B.J., Hwang, W.S., Loh, W.Y., Tang, L.J., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83651
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83651
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spelling	sg-nus-scholar.10635-836512015-02-11T01:52:35Z Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric Park, C.S. Cho, B.J. Hwang, W.S. Loh, W.Y. Tang, L.J. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/.2005.1469207 Digest of Technical Papers - Symposium on VLSI Technology 2005 48-49 DTPTE 2014-10-07T04:43:38Z 2014-10-07T04:43:38Z 2005 Conference Paper Park, C.S.,Cho, B.J.,Hwang, W.S.,Loh, W.Y.,Tang, L.J.,Kwong, D.-L. (2005). Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric. Digest of Technical Papers - Symposium on VLSI Technology 2005 : 48-49. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/.2005.1469207" target="_blank">https://doi.org/10.1109/.2005.1469207</a> 07431562 http://scholarbank.nus.edu.sg/handle/10635/83651 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/.2005.1469207
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Park, C.S. Cho, B.J. Hwang, W.S. Loh, W.Y. Tang, L.J. Kwong, D.-L.
format	Conference or Workshop Item
author	Park, C.S. Cho, B.J. Hwang, W.S. Loh, W.Y. Tang, L.J. Kwong, D.-L.
spellingShingle	Park, C.S. Cho, B.J. Hwang, W.S. Loh, W.Y. Tang, L.J. Kwong, D.-L. Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
author_sort	Park, C.S.
title	Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
title_short	Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
title_full	Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
title_fullStr	Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
title_full_unstemmed	Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
title_sort	dual metal gate process by metal substitution of dopant-free polysilicon on high-k dielectric
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83651
_version_	1681089475131736064

Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric

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