Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric

• Main Authors: Park, C.S., Cho, B.J., Hwang, W.S., Loh, W.Y., Tang, L.J., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83651
• Institution: National University of Singapore

10.1109/.2005.1469207