Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric
10.1109/.2005.1469207
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| Main Authors: | , , , , , |
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| 格式: | Conference or Workshop Item |
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2014
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| 在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/83651 |
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