Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack

Technical Digest - International Electron Devices Meeting, IEDM

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Main Authors:	Whang, S.J., Lee, S.J., Gao, F., Wu, N., Zhu, C.X., Pan, J.S., Tang, L.J., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83762
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83762
record_format	dspace
spelling	sg-nus-scholar.10635-837622015-03-16T10:06:32Z Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack Whang, S.J. Lee, S.J. Gao, F. Wu, N. Zhu, C.X. Pan, J.S. Tang, L.J. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING Technical Digest - International Electron Devices Meeting, IEDM 307-310 TDIMD 2014-10-07T04:44:53Z 2014-10-07T04:44:53Z 2004 Conference Paper Whang, S.J.,Lee, S.J.,Gao, F.,Wu, N.,Zhu, C.X.,Pan, J.S.,Tang, L.J.,Kwong, D.L. (2004). Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack. Technical Digest - International Electron Devices Meeting, IEDM : 307-310. ScholarBank@NUS Repository. 01631918 http://scholarbank.nus.edu.sg/handle/10635/83762 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Technical Digest - International Electron Devices Meeting, IEDM
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Whang, S.J. Lee, S.J. Gao, F. Wu, N. Zhu, C.X. Pan, J.S. Tang, L.J. Kwong, D.L.
format	Conference or Workshop Item
author	Whang, S.J. Lee, S.J. Gao, F. Wu, N. Zhu, C.X. Pan, J.S. Tang, L.J. Kwong, D.L.
spellingShingle	Whang, S.J. Lee, S.J. Gao, F. Wu, N. Zhu, C.X. Pan, J.S. Tang, L.J. Kwong, D.L. Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
author_sort	Whang, S.J.
title	Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
title_short	Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
title_full	Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
title_fullStr	Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
title_full_unstemmed	Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack
title_sort	germanium p- & n-mosfets fabricated with novel surface passivation (plasma-ph 3 and thin aln) and tan/hfo 2 gate stack
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83762
_version_	1681089495571628032

Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack

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