High Performance ALD HfO 2-Al 2O 3 Laminate MIM Capacitors for RF and Mixed Signal IC Applications

• Main Authors: Hu, H., Ding, S.-J., Lim, H.F., Zhu, C., Li, M.F., Kim, S.J., Yu, X.F., Chen, J.H., Yong, Y.F., Cho, B.J., Chan, D.S.H., Rustagi, S.C., Yu, M.B., Tung, C.H., Du, A., My, D., Foo, P.D., Chin, A., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83782
• Institution: National University of Singapore

Technical Digest - International Electron Devices Meeting