High performance high-k/metal gate germanium MOSFETs with shallow junction fabricated by laser thermal process

High performance high-k/metal gate germanium MOSFETs with shallow junction fabricated by laser thermal process

10.1109/ICSICT.2006.306122

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Bibliographic Details
Main Authors: Zhang, Q.C., Huang, J.D., Wu, N., Chen, G.X., Hong, M.H., Bera, L.K., Zhu, C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83784
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Institution: National University of Singapore
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Summary:10.1109/ICSICT.2006.306122

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