High performance high-k/metal gate germanium MOSFETs with shallow junction fabricated by laser thermal process

• Main Authors: Zhang, Q.C., Huang, J.D., Wu, N., Chen, G.X., Hong, M.H., Bera, L.K., Zhu, C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83784
• Institution: National University of Singapore

10.1109/ICSICT.2006.306122