HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications

Proceedings - Electrochemical Society

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Main Authors:	Ding, S.-J., Zhu, C., Li, M.-F., Cho, B.J., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83799
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83799
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spelling	sg-nus-scholar.10635-837992015-02-15T19:18:14Z HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications Ding, S.-J. Zhu, C. Li, M.-F. Cho, B.J. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Proceedings - Electrochemical Society 11 476-480 2014-10-07T04:45:19Z 2014-10-07T04:45:19Z 2004 Conference Paper Ding, S.-J.,Zhu, C.,Li, M.-F.,Cho, B.J.,Kwong, D.-L. (2004). HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications. Proceedings - Electrochemical Society 11 : 476-480. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/83799 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Proceedings - Electrochemical Society
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ding, S.-J. Zhu, C. Li, M.-F. Cho, B.J. Kwong, D.-L.
format	Conference or Workshop Item
author	Ding, S.-J. Zhu, C. Li, M.-F. Cho, B.J. Kwong, D.-L.
spellingShingle	Ding, S.-J. Zhu, C. Li, M.-F. Cho, B.J. Kwong, D.-L. HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
author_sort	Ding, S.-J.
title	HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
title_short	HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
title_full	HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
title_fullStr	HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
title_full_unstemmed	HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
title_sort	high-kappa; mim capacitors with atomic-layer-deposited hfo 2-al2o3 laminated and sandwiched dielectrics for analog circuit applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83799
_version_	1681089502412537856

HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications

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