HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications

HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications

Proceedings - Electrochemical Society

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Bibliographic Details
Main Authors: Ding, S.-J., Zhu, C., Li, M.-F., Cho, B.J., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83799
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/83799

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