HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications
Proceedings - Electrochemical Society
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Main Authors: | Ding, S.-J., Zhu, C., Li, M.-F., Cho, B.J., Kwong, D.-L. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83799 |
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Institution: | National University of Singapore |
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