HiGH-kappa; MIM capacitors with atomic-layer-deposited HfO 2-Al2O3 laminated and sandwiched dielectrics for analog circuit applications

• Main Authors: Ding, S.-J., Zhu, C., Li, M.-F., Cho, B.J., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83799
• Institution: National University of Singapore

Proceedings - Electrochemical Society