Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
10.1016/j.tsf.2005.09.033
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2014
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sg-nus-scholar.10635-839452024-11-10T21:13:27Z Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology Li, R. Yao, H.B. Lee, S.J. Chi, D.Z. Yu, M.B. Lo, G.Q. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING Germanide Germanium (Ge) MOSFET Schottky 10.1016/j.tsf.2005.09.033 Thin Solid Films 504 1-2 28-31 THSFA 2014-10-07T04:47:00Z 2014-10-07T04:47:00Z 2006-05-10 Conference Paper Li, R., Yao, H.B., Lee, S.J., Chi, D.Z., Yu, M.B., Lo, G.Q., Kwong, D.L. (2006-05-10). Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology. Thin Solid Films 504 (1-2) : 28-31. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.033 00406090 http://scholarbank.nus.edu.sg/handle/10635/83945 000236486200008 Scopus |
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Germanide Germanium (Ge) MOSFET Schottky |
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Germanide Germanium (Ge) MOSFET Schottky Li, R. Yao, H.B. Lee, S.J. Chi, D.Z. Yu, M.B. Lo, G.Q. Kwong, D.L. Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
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10.1016/j.tsf.2005.09.033 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Li, R. Yao, H.B. Lee, S.J. Chi, D.Z. Yu, M.B. Lo, G.Q. Kwong, D.L. |
format |
Conference or Workshop Item |
author |
Li, R. Yao, H.B. Lee, S.J. Chi, D.Z. Yu, M.B. Lo, G.Q. Kwong, D.L. |
author_sort |
Li, R. |
title |
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
title_short |
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
title_full |
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
title_fullStr |
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
title_full_unstemmed |
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology |
title_sort |
metal-germanide schottky source/drain transistor on germanium substrate for future cmos technology |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/83945 |
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1821216336400875520 |