Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology

10.1016/j.tsf.2005.09.033

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Bibliographic Details
Main Authors: Li, R., Yao, H.B., Lee, S.J., Chi, D.Z., Yu, M.B., Lo, G.Q., Kwong, D.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/83945
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-839452024-11-10T21:13:27Z Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology Li, R. Yao, H.B. Lee, S.J. Chi, D.Z. Yu, M.B. Lo, G.Q. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING Germanide Germanium (Ge) MOSFET Schottky 10.1016/j.tsf.2005.09.033 Thin Solid Films 504 1-2 28-31 THSFA 2014-10-07T04:47:00Z 2014-10-07T04:47:00Z 2006-05-10 Conference Paper Li, R., Yao, H.B., Lee, S.J., Chi, D.Z., Yu, M.B., Lo, G.Q., Kwong, D.L. (2006-05-10). Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology. Thin Solid Films 504 (1-2) : 28-31. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.033 00406090 http://scholarbank.nus.edu.sg/handle/10635/83945 000236486200008 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Germanide
Germanium (Ge)
MOSFET
Schottky
spellingShingle Germanide
Germanium (Ge)
MOSFET
Schottky
Li, R.
Yao, H.B.
Lee, S.J.
Chi, D.Z.
Yu, M.B.
Lo, G.Q.
Kwong, D.L.
Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
description 10.1016/j.tsf.2005.09.033
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Li, R.
Yao, H.B.
Lee, S.J.
Chi, D.Z.
Yu, M.B.
Lo, G.Q.
Kwong, D.L.
format Conference or Workshop Item
author Li, R.
Yao, H.B.
Lee, S.J.
Chi, D.Z.
Yu, M.B.
Lo, G.Q.
Kwong, D.L.
author_sort Li, R.
title Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
title_short Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
title_full Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
title_fullStr Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
title_full_unstemmed Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
title_sort metal-germanide schottky source/drain transistor on germanium substrate for future cmos technology
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83945
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