P-FinFETs with Al segregated NiSi/p+-Si source/drain contact junction for series resistance reduction

• Main Authors: Sinha, M., Lee, R.T.P., Devi, S.N., Lo, G.-Q., Chor, E.F., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84082
• Institution: National University of Singapore

10.1109/VTSA.2009.5159297