Work function tuning of metal nitride electrodes for advanced CMOS devices

• Main Authors: Ren, C., Faizhal, B.B., Chan, D.S.H., Li, M.-F., Yeo, Y.-C., Trigg, A.D., Balasubramanian, N., Kwong, D.-L.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Lanthanide; Metal gate electrode; Metal nitride; Work function tuning
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/84367
• 機構: National University of Singapore

10.1016/j.tsf.2005.09.081