Monitoring and control of photoresist properties and CD during photoresist processing

• Main Authors: Yang, G., Ngo, Y.-S., Putra, A.S., Ang, K.-T., Tay, A., Fang, Z.-P.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Photoresist processing; real-time control; temperature control
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/84485

10.1117/12.846560