Monitoring and control of photoresist properties and CD during photoresist processing

Monitoring and control of photoresist properties and CD during photoresist processing

10.1117/12.846560

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Bibliographic Details
Main Authors: Yang, G., Ngo, Y.-S., Putra, A.S., Ang, K.-T., Tay, A., Fang, Z.-P.
Other Authors: DEAN'S OFFICE (ENGINEERING)
Format: Conference or Workshop Item
Published: 2014
Subjects:
Photoresist processing
real-time control
temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84485
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Institution: National University of Singapore

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