Pore sealing by NH3 plasma treatment of porous low dielectric constant films

10.1149/1.2435625

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Bibliographic Details
Main Authors:	Peng, H.-G., Chi, D.-Z., Wang, W.-D., Li, J.-H., Zeng, K.-Y., Vallery, R.S., Frieze, W.E., Skalsey, M.A., Gidley, D.W., Yee, A.F.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85560
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-85560
record_format	dspace
spelling	sg-nus-scholar.10635-855602023-10-26T20:08:38Z Pore sealing by NH3 plasma treatment of porous low dielectric constant films Peng, H.-G. Chi, D.-Z. Wang, W.-D. Li, J.-H. Zeng, K.-Y. Vallery, R.S. Frieze, W.E. Skalsey, M.A. Gidley, D.W. Yee, A.F. MECHANICAL ENGINEERING 10.1149/1.2435625 Journal of the Electrochemical Society 154 4 G85-G94 JESOA 2014-10-07T09:09:26Z 2014-10-07T09:09:26Z 2007 Article Peng, H.-G., Chi, D.-Z., Wang, W.-D., Li, J.-H., Zeng, K.-Y., Vallery, R.S., Frieze, W.E., Skalsey, M.A., Gidley, D.W., Yee, A.F. (2007). Pore sealing by NH3 plasma treatment of porous low dielectric constant films. Journal of the Electrochemical Society 154 (4) : G85-G94. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2435625 00134651 http://scholarbank.nus.edu.sg/handle/10635/85560 000244792200054 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.2435625
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Peng, H.-G. Chi, D.-Z. Wang, W.-D. Li, J.-H. Zeng, K.-Y. Vallery, R.S. Frieze, W.E. Skalsey, M.A. Gidley, D.W. Yee, A.F.
format	Article
author	Peng, H.-G. Chi, D.-Z. Wang, W.-D. Li, J.-H. Zeng, K.-Y. Vallery, R.S. Frieze, W.E. Skalsey, M.A. Gidley, D.W. Yee, A.F.
spellingShingle	Peng, H.-G. Chi, D.-Z. Wang, W.-D. Li, J.-H. Zeng, K.-Y. Vallery, R.S. Frieze, W.E. Skalsey, M.A. Gidley, D.W. Yee, A.F. Pore sealing by NH3 plasma treatment of porous low dielectric constant films
author_sort	Peng, H.-G.
title	Pore sealing by NH3 plasma treatment of porous low dielectric constant films
title_short	Pore sealing by NH3 plasma treatment of porous low dielectric constant films
title_full	Pore sealing by NH3 plasma treatment of porous low dielectric constant films
title_fullStr	Pore sealing by NH3 plasma treatment of porous low dielectric constant films
title_full_unstemmed	Pore sealing by NH3 plasma treatment of porous low dielectric constant films
title_sort	pore sealing by nh3 plasma treatment of porous low dielectric constant films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85560
_version_	1781784703178637312

Pore sealing by NH3 plasma treatment of porous low dielectric constant films

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