Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication
10.1116/1.1503791
Saved in:
Main Authors: | , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/92306 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-92306 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-923062023-10-30T21:50:32Z Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. CHEMICAL & ENVIRONMENTAL ENGINEERING 10.1116/1.1503791 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 5 1974-1981 JVTBD 2014-10-09T10:00:05Z 2014-10-09T10:00:05Z 2002-09 Article Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L. (2002-09). Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 (5) : 1974-1981. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1503791 10711023 http://scholarbank.nus.edu.sg/handle/10635/92306 000178669200029 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1116/1.1503791 |
author2 |
CHEMICAL & ENVIRONMENTAL ENGINEERING |
author_facet |
CHEMICAL & ENVIRONMENTAL ENGINEERING Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. |
format |
Article |
author |
Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. |
spellingShingle |
Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
author_sort |
Sin, C.-Y. |
title |
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
title_short |
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
title_full |
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
title_fullStr |
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
title_full_unstemmed |
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication |
title_sort |
resist trimming in high-density cf4/o2 plasmas for sub-0.1 μm device fabrication |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/92306 |
_version_ |
1781785769274245120 |