A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: The Si, Ti and N results

A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: The Si, Ti and N results

10.1107/S0909049500018252

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Bibliographic Details
Main Authors: Hu, Y.F., Sham, T.K., Zou, Z., Xu, G.Q., Chan, L., Yates, B.W., Bancroft, G.M.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
Diffusion barrier
Oxidation reaction
Titanium nitride
XANES
Online Access:http://scholarbank.nus.edu.sg/handle/10635/93017
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/93017

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