A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: The Si, Ti and N results
10.1107/S0909049500018252
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Main Authors: | Hu, Y.F., Sham, T.K., Zou, Z., Xu, G.Q., Chan, L., Yates, B.W., Bancroft, G.M. |
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Other Authors: | CHEMISTRY |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/93017 |
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Institution: | National University of Singapore |
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