Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation
10.1016/S0040-6090(01)01401-8
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2014
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sg-nus-scholar.10635-964422023-10-30T22:54:12Z Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation Wang, C.Y. Zheng, J.Z. Shen, Z.X. Lin, Y. Wee, A.T.S. PHYSICS Dielectrics Fourier-transform infrared spectroscopy Ion implantation Secondary ion mass spectrometry 10.1016/S0040-6090(01)01401-8 Thin Solid Films 397 1-2 90-94 THSFA 2014-10-16T09:23:29Z 2014-10-16T09:23:29Z 2001-11-01 Article Wang, C.Y., Zheng, J.Z., Shen, Z.X., Lin, Y., Wee, A.T.S. (2001-11-01). Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation. Thin Solid Films 397 (1-2) : 90-94. ScholarBank@NUS Repository. https://doi.org/10.1016/S0040-6090(01)01401-8 00406090 http://scholarbank.nus.edu.sg/handle/10635/96442 000171839300015 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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ScholarBank@NUS |
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Dielectrics Fourier-transform infrared spectroscopy Ion implantation Secondary ion mass spectrometry |
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Dielectrics Fourier-transform infrared spectroscopy Ion implantation Secondary ion mass spectrometry Wang, C.Y. Zheng, J.Z. Shen, Z.X. Lin, Y. Wee, A.T.S. Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| description |
10.1016/S0040-6090(01)01401-8 |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Wang, C.Y. Zheng, J.Z. Shen, Z.X. Lin, Y. Wee, A.T.S. |
| format |
Article |
| author |
Wang, C.Y. Zheng, J.Z. Shen, Z.X. Lin, Y. Wee, A.T.S. |
| author_sort |
Wang, C.Y. |
| title |
Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| title_short |
Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| title_full |
Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| title_fullStr |
Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| title_full_unstemmed |
Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation |
| title_sort |
elimination of o2 plasma damage of low-k methyl silsesquioxane film by as implantation |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/96442 |
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1781786465187921920 |