Elimination of O2 plasma damage of low-k methyl silsesquioxane film by As implantation

• Main Authors: Wang, C.Y., Zheng, J.Z., Shen, Z.X., Lin, Y., Wee, A.T.S.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: Dielectrics; Fourier-transform infrared spectroscopy; Ion implantation; Secondary ion mass spectrometry
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/96442
• Institution: National University of Singapore

10.1016/S0040-6090(01)01401-8