Localized breakdown in dielectrics and macroscopic charge transport through the whole gate stack: A comparative study

Localized breakdown in dielectrics and macroscopic charge transport through the whole gate stack: A comparative study

10.1063/1.2830814

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Bibliographic Details
Main Authors: Zheng, Y., Wee, A.T.S., Ong, Y.C., Pey, K.L., Troadec, C., O'Shea, S.J., Chandrasekhar, N.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/97087
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/97087

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