Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
10.1063/1.2354446
Saved in:
Main Authors: | , , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/97835 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-97835 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-978352023-10-25T21:27:16Z Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Tung, C.H. Tang, L.J. Chong, Y.F. PHYSICS 10.1063/1.2354446 Applied Physics Letters 89 12 - APPLA 2014-10-16T09:39:53Z 2014-10-16T09:39:53Z 2006 Article Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Tung, C.H., Tang, L.J., Chong, Y.F. (2006). Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor. Applied Physics Letters 89 (12) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2354446 00036951 http://scholarbank.nus.edu.sg/handle/10635/97835 000240680300064 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1063/1.2354446 |
author2 |
PHYSICS |
author_facet |
PHYSICS Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Tung, C.H. Tang, L.J. Chong, Y.F. |
format |
Article |
author |
Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Tung, C.H. Tang, L.J. Chong, Y.F. |
spellingShingle |
Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Tung, C.H. Tang, L.J. Chong, Y.F. Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
author_sort |
Ong, K.K. |
title |
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
title_short |
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
title_full |
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
title_fullStr |
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
title_full_unstemmed |
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
title_sort |
role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/97835 |
_version_ |
1781786753097531392 |