Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor

10.1063/1.2354446

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Bibliographic Details
Main Authors: Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Tung, C.H., Tang, L.J., Chong, Y.F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/97835
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-978352023-10-25T21:27:16Z Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Tung, C.H. Tang, L.J. Chong, Y.F. PHYSICS 10.1063/1.2354446 Applied Physics Letters 89 12 - APPLA 2014-10-16T09:39:53Z 2014-10-16T09:39:53Z 2006 Article Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Tung, C.H., Tang, L.J., Chong, Y.F. (2006). Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor. Applied Physics Letters 89 (12) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2354446 00036951 http://scholarbank.nus.edu.sg/handle/10635/97835 000240680300064 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.2354446
author2 PHYSICS
author_facet PHYSICS
Ong, K.K.
Pey, K.L.
Lee, P.S.
Wee, A.T.S.
Wang, X.C.
Tung, C.H.
Tang, L.J.
Chong, Y.F.
format Article
author Ong, K.K.
Pey, K.L.
Lee, P.S.
Wee, A.T.S.
Wang, X.C.
Tung, C.H.
Tang, L.J.
Chong, Y.F.
spellingShingle Ong, K.K.
Pey, K.L.
Lee, P.S.
Wee, A.T.S.
Wang, X.C.
Tung, C.H.
Tang, L.J.
Chong, Y.F.
Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
author_sort Ong, K.K.
title Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
title_short Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
title_full Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
title_fullStr Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
title_full_unstemmed Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
title_sort role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/97835
_version_ 1781786753097531392