Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy

10.1063/1.1592310

Saved in:
Bibliographic Details
Main Authors: Nakajima, K., Joumori, S., Suzuki, M., Kimura, K., Osipowicz, T., Tok, K.L., Zheng, J.Z., See, A., Zhang, B.C.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98031
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-98031
record_format dspace
spelling sg-nus-scholar.10635-980312023-10-26T21:23:48Z Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy Nakajima, K. Joumori, S. Suzuki, M. Kimura, K. Osipowicz, T. Tok, K.L. Zheng, J.Z. See, A. Zhang, B.C. PHYSICS 10.1063/1.1592310 Applied Physics Letters 83 2 296-298 APPLA 2014-10-16T09:42:11Z 2014-10-16T09:42:11Z 2003-07-14 Article Nakajima, K., Joumori, S., Suzuki, M., Kimura, K., Osipowicz, T., Tok, K.L., Zheng, J.Z., See, A., Zhang, B.C. (2003-07-14). Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy. Applied Physics Letters 83 (2) : 296-298. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1592310 00036951 http://scholarbank.nus.edu.sg/handle/10635/98031 000184038900031 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.1592310
author2 PHYSICS
author_facet PHYSICS
Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
format Article
author Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
spellingShingle Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
author_sort Nakajima, K.
title Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
title_short Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
title_full Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
title_fullStr Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
title_full_unstemmed Strain profiling of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
title_sort strain profiling of hfo2/si(001) interface with high-resolution rutherford backscattering spectroscopy
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98031
_version_ 1781786792650866688