Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure

10.1023/A:1026756309590

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Main Authors:	Lee, Y.K., Latt, K.M., Jaehyung, K., Osipowicz, T., Chiam, S.-Y., Lee, K.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/98091
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-98091
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spelling	sg-nus-scholar.10635-980912023-10-30T08:05:17Z Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure Lee, Y.K. Latt, K.M. Jaehyung, K. Osipowicz, T. Chiam, S.-Y. Lee, K. PHYSICS 10.1023/A:1026756309590 Journal of Materials Science 35 23 5857-5860 JMTSA 2014-10-16T09:42:56Z 2014-10-16T09:42:56Z 2000-12 Article Lee, Y.K., Latt, K.M., Jaehyung, K., Osipowicz, T., Chiam, S.-Y., Lee, K. (2000-12). Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure. Journal of Materials Science 35 (23) : 5857-5860. ScholarBank@NUS Repository. https://doi.org/10.1023/A:1026756309590 00222461 http://scholarbank.nus.edu.sg/handle/10635/98091 000166294100009 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1023/A:1026756309590
author2	PHYSICS
author_facet	PHYSICS Lee, Y.K. Latt, K.M. Jaehyung, K. Osipowicz, T. Chiam, S.-Y. Lee, K.
format	Article
author	Lee, Y.K. Latt, K.M. Jaehyung, K. Osipowicz, T. Chiam, S.-Y. Lee, K.
spellingShingle	Lee, Y.K. Latt, K.M. Jaehyung, K. Osipowicz, T. Chiam, S.-Y. Lee, K. Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
author_sort	Lee, Y.K.
title	Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
title_short	Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
title_full	Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
title_fullStr	Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
title_full_unstemmed	Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
title_sort	study of interfacial reactions in ionized metal plasma (imp) deposited al-0.5%wt cu/ti/sio2si structure
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/98091
_version_	1781786804276428800

Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure

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