Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure
10.1023/A:1026756309590
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Main Authors: | Lee, Y.K., Latt, K.M., Jaehyung, K., Osipowicz, T., Chiam, S.-Y., Lee, K. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98091 |
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Institution: | National University of Singapore |
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