Study of interfacial reactions in ionized metal plasma (IMP) deposited Al-0.5%wt Cu/Ti/SiO2Si structure

10.1023/A:1026756309590

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Bibliographic Details
Main Authors:	Lee, Y.K., Latt, K.M., Jaehyung, K., Osipowicz, T., Chiam, S.-Y., Lee, K.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/98091
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Institution:	National University of Singapore

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Summary:	10.1023/A:1026756309590

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