Thermal stability study of NiSi and NiSi2 thin films
10.1016/j.mee.2003.08.010
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sg-nus-scholar.10635-983712024-11-08T21:04:29Z Thermal stability study of NiSi and NiSi2 thin films Zhao, F.F. Zheng, J.Z. Shen, Z.X. Osipowicz, T. Gao, W.Z. Chan, L.H. PHYSICS Nickel silicides Thermal stability Thin film 10.1016/j.mee.2003.08.010 Microelectronic Engineering 71 1 104-111 MIENE 2014-10-16T09:46:17Z 2014-10-16T09:46:17Z 2004-01 Article Zhao, F.F., Zheng, J.Z., Shen, Z.X., Osipowicz, T., Gao, W.Z., Chan, L.H. (2004-01). Thermal stability study of NiSi and NiSi2 thin films. Microelectronic Engineering 71 (1) : 104-111. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2003.08.010 01679317 http://scholarbank.nus.edu.sg/handle/10635/98371 000188002800013 Scopus |
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Nickel silicides Thermal stability Thin film |
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Nickel silicides Thermal stability Thin film Zhao, F.F. Zheng, J.Z. Shen, Z.X. Osipowicz, T. Gao, W.Z. Chan, L.H. Thermal stability study of NiSi and NiSi2 thin films |
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10.1016/j.mee.2003.08.010 |
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PHYSICS |
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PHYSICS Zhao, F.F. Zheng, J.Z. Shen, Z.X. Osipowicz, T. Gao, W.Z. Chan, L.H. |
format |
Article |
author |
Zhao, F.F. Zheng, J.Z. Shen, Z.X. Osipowicz, T. Gao, W.Z. Chan, L.H. |
author_sort |
Zhao, F.F. |
title |
Thermal stability study of NiSi and NiSi2 thin films |
title_short |
Thermal stability study of NiSi and NiSi2 thin films |
title_full |
Thermal stability study of NiSi and NiSi2 thin films |
title_fullStr |
Thermal stability study of NiSi and NiSi2 thin films |
title_full_unstemmed |
Thermal stability study of NiSi and NiSi2 thin films |
title_sort |
thermal stability study of nisi and nisi2 thin films |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/98371 |
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1821206705916084224 |