Thermal stability study of NiSi and NiSi2 thin films

10.1016/j.mee.2003.08.010

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Bibliographic Details
Main Authors: Zhao, F.F., Zheng, J.Z., Shen, Z.X., Osipowicz, T., Gao, W.Z., Chan, L.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/98371
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Institution: National University of Singapore

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