Deep ion beam lithography for micromachining applications

Deep ion beam lithography for micromachining applications

10.1117/12.280533

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Bibliographic Details
Main Authors: Springham, S.V., Osipowicz, T., Sanchez, J.L., Lee, S., Watt, F.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
DIBL
High aspect-ratio
LIGA
Mask fabrication
MEMS
Micromachining
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98663
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Institution: National University of Singapore
Description
Summary:10.1117/12.280533

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