Deep ion beam lithography for micromachining applications
10.1117/12.280533
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sg-nus-scholar.10635-986632023-10-26T20:18:11Z Deep ion beam lithography for micromachining applications Springham, S.V. Osipowicz, T. Sanchez, J.L. Lee, S. Watt, F. PHYSICS DIBL High aspect-ratio LIGA Mask fabrication MEMS Micromachining 10.1117/12.280533 Proceedings of SPIE - The International Society for Optical Engineering 3183 128-137 PSISD 2014-10-16T09:49:56Z 2014-10-16T09:49:56Z 1997 Conference Paper Springham, S.V., Osipowicz, T., Sanchez, J.L., Lee, S., Watt, F. (1997). Deep ion beam lithography for micromachining applications. Proceedings of SPIE - The International Society for Optical Engineering 3183 : 128-137. ScholarBank@NUS Repository. https://doi.org/10.1117/12.280533 0277786X http://scholarbank.nus.edu.sg/handle/10635/98663 A1997BJ57L00013 Scopus |
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DIBL High aspect-ratio LIGA Mask fabrication MEMS Micromachining |
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DIBL High aspect-ratio LIGA Mask fabrication MEMS Micromachining Springham, S.V. Osipowicz, T. Sanchez, J.L. Lee, S. Watt, F. Deep ion beam lithography for micromachining applications |
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10.1117/12.280533 |
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PHYSICS |
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PHYSICS Springham, S.V. Osipowicz, T. Sanchez, J.L. Lee, S. Watt, F. |
format |
Conference or Workshop Item |
author |
Springham, S.V. Osipowicz, T. Sanchez, J.L. Lee, S. Watt, F. |
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Springham, S.V. |
title |
Deep ion beam lithography for micromachining applications |
title_short |
Deep ion beam lithography for micromachining applications |
title_full |
Deep ion beam lithography for micromachining applications |
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Deep ion beam lithography for micromachining applications |
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Deep ion beam lithography for micromachining applications |
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deep ion beam lithography for micromachining applications |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98663 |
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1781786925960527872 |