Interface Engineering in the High-k Dielectric Gate Stacks
10.1002/9783527646340.ch9
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sg-nus-scholar.10635-989802015-01-30T12:47:02Z Interface Engineering in the High-k Dielectric Gate Stacks Wang, S. Feng, Y. Huan, A.C.H. PHYSICS Gate dielectric Heterojunction High-k dielectric material Keywords: band offset Metal/semiconductor interfaces Schottky barrier height 10.1002/9783527646340.ch9 High-k Gate Dielectrics for CMOS Technology 293-318 2014-10-16T09:53:46Z 2014-10-16T09:53:46Z 2012-08-23 Others Wang, S.,Feng, Y.,Huan, A.C.H. (2012-08-23). Interface Engineering in the High-k Dielectric Gate Stacks. High-k Gate Dielectrics for CMOS Technology : 293-318. ScholarBank@NUS Repository. <a href="https://doi.org/10.1002/9783527646340.ch9" target="_blank">https://doi.org/10.1002/9783527646340.ch9</a> 9783527330324 http://scholarbank.nus.edu.sg/handle/10635/98980 NOT_IN_WOS Scopus |
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Gate dielectric Heterojunction High-k dielectric material Keywords: band offset Metal/semiconductor interfaces Schottky barrier height |
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Gate dielectric Heterojunction High-k dielectric material Keywords: band offset Metal/semiconductor interfaces Schottky barrier height Wang, S. Feng, Y. Huan, A.C.H. Interface Engineering in the High-k Dielectric Gate Stacks |
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10.1002/9783527646340.ch9 |
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PHYSICS |
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PHYSICS Wang, S. Feng, Y. Huan, A.C.H. |
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Wang, S. Feng, Y. Huan, A.C.H. |
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Wang, S. |
title |
Interface Engineering in the High-k Dielectric Gate Stacks |
title_short |
Interface Engineering in the High-k Dielectric Gate Stacks |
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Interface Engineering in the High-k Dielectric Gate Stacks |
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Interface Engineering in the High-k Dielectric Gate Stacks |
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Interface Engineering in the High-k Dielectric Gate Stacks |
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interface engineering in the high-k dielectric gate stacks |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98980 |
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