Interface Engineering in the High-k Dielectric Gate Stacks

10.1002/9783527646340.ch9

Saved in:
Bibliographic Details
Main Authors: Wang, S., Feng, Y., Huan, A.C.H.
Other Authors: PHYSICS
Format: Others
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98980
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-98980
record_format dspace
spelling sg-nus-scholar.10635-989802015-01-30T12:47:02Z Interface Engineering in the High-k Dielectric Gate Stacks Wang, S. Feng, Y. Huan, A.C.H. PHYSICS Gate dielectric Heterojunction High-k dielectric material Keywords: band offset Metal/semiconductor interfaces Schottky barrier height 10.1002/9783527646340.ch9 High-k Gate Dielectrics for CMOS Technology 293-318 2014-10-16T09:53:46Z 2014-10-16T09:53:46Z 2012-08-23 Others Wang, S.,Feng, Y.,Huan, A.C.H. (2012-08-23). Interface Engineering in the High-k Dielectric Gate Stacks. High-k Gate Dielectrics for CMOS Technology : 293-318. ScholarBank@NUS Repository. <a href="https://doi.org/10.1002/9783527646340.ch9" target="_blank">https://doi.org/10.1002/9783527646340.ch9</a> 9783527330324 http://scholarbank.nus.edu.sg/handle/10635/98980 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Gate dielectric
Heterojunction
High-k dielectric material
Keywords: band offset
Metal/semiconductor interfaces
Schottky barrier height
spellingShingle Gate dielectric
Heterojunction
High-k dielectric material
Keywords: band offset
Metal/semiconductor interfaces
Schottky barrier height
Wang, S.
Feng, Y.
Huan, A.C.H.
Interface Engineering in the High-k Dielectric Gate Stacks
description 10.1002/9783527646340.ch9
author2 PHYSICS
author_facet PHYSICS
Wang, S.
Feng, Y.
Huan, A.C.H.
format Others
author Wang, S.
Feng, Y.
Huan, A.C.H.
author_sort Wang, S.
title Interface Engineering in the High-k Dielectric Gate Stacks
title_short Interface Engineering in the High-k Dielectric Gate Stacks
title_full Interface Engineering in the High-k Dielectric Gate Stacks
title_fullStr Interface Engineering in the High-k Dielectric Gate Stacks
title_full_unstemmed Interface Engineering in the High-k Dielectric Gate Stacks
title_sort interface engineering in the high-k dielectric gate stacks
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98980
_version_ 1681092123069251584