Interface Engineering in the High-k Dielectric Gate Stacks
10.1002/9783527646340.ch9
Saved in:
Main Authors: | Wang, S., Feng, Y., Huan, A.C.H. |
---|---|
Other Authors: | PHYSICS |
Format: | Others |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98980 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Hafnium oxide based high-k dielectric gate stack
by: LI QIN
Published: (2010) -
Band engineering in the high-k dielectrics gate stacks
by: Wang, S.J., et al.
Published: (2014) -
Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
by: JOO MOON SIG
Published: (2010) -
Gate stack engineering of germanium mosfets with high-K dielectrics
by: WU NAN
Published: (2010) -
Schottky-barrier S/D MOSFETs with high-K gate dielectrics and metal-gate electrode
by: Zhu, S., et al.
Published: (2014)