Programmable proximity aperture lithography with MeV ion beams

• المؤلفون الرئيسيون: Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, Harry J. Whitlow
• التنسيق: دورية
• منشور في: 2018
• الموضوعات: Engineering; Physics and Astronomy
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=53349156593&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/60419

A novel MeV ion beam programmable proximity aperture lithography system has been constructed at the Accelerator Laboratory of the University of Jyväskylä, Finland. This facility can be used to fabricate three dimensional microstructures in thick (<100 μm) polymer resist such as polymethylmethacry...