Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

• المؤلفون الرئيسيون: S. Gorelick, N. Puttaraksa, T. Sajavaara, M. Laitinen, S. Singkarat, H. J. Whitlow
• التنسيق: دورية
• منشور في: 2018
• الموضوعات: Physics and Astronomy
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449134554&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/60738

MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The micro...