STUDI PENGARUH LAPISAN PENYANGGA TERHADAP KUALITAS FILM TIPIS GAN DITUMBUHKAN DENGAN METODE MOCVD BERBANTUAN PLASMA

<b>Abstract :</b><p align=\"justify\">The effect of the buffer layer thickness on GaN film which was grown by plasma-assisted metalorganic chemical vapor deposition (PAMOCVD) technique have been investigated. The buffer layer thickness were varied from 0 to 400 A. The GaN...

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Bibliographic Details
Main Author: S. Hasan , Erzam
Format: Theses
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/5075
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Institution: Institut Teknologi Bandung
Language: Indonesia

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