Large scale low cost fabrication of diameter controllable silicon nanowire arrays

We report on a novel solution etching method to fabricate vertically aligned aperiodic silicon nanowire (SiNW) arrays. We begin with a simple dewetting process to fabricate a monolayer of well-spaced metal particles in situ on a silicon wafer. The particles function as a sacrificial template to patt...

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Bibliographic Details
Main Authors: Sun, Leimeng, Fan, Yu, Wang, Xinghui, Agung Susantyoko, Rahmat, Zhang, Qing
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2014
Subjects:
Online Access:https://hdl.handle.net/10356/103458
http://hdl.handle.net/10220/24497
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Institution: Nanyang Technological University
Language: English

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