Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate
A GeSn/Ge multiple-quantum-well (MQW) p-i-n photodiode structure was proposed for simultaneously realizing high detectivity photo detection with low dark current and effective optical modulation based on the quantum confined Stark (QCSE) effect. The MQW stacks were grown on a 300-mm Ge-buffered Si s...
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sg-ntu-dr.10356-1443862020-11-03T01:17:29Z Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate Zhou, Hao Xu, Shengqiang Wu, Shaoteng Huang, Yi-Chiau Zhao, Peng Tong, Jinchao Son, Bongkwon Guo, Xin Zhang, Dao Hua Gong, Xiao Tan, Chuan Seng School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering::Semiconductors Germanium-Tin Photodetector A GeSn/Ge multiple-quantum-well (MQW) p-i-n photodiode structure was proposed for simultaneously realizing high detectivity photo detection with low dark current and effective optical modulation based on the quantum confined Stark (QCSE) effect. The MQW stacks were grown on a 300-mm Ge-buffered Si substrate using reduced pressure chemical vapor deposition (RPCVD). GeSn/Ge MQW p-i-n photodiodes with varying mesa diameters were fabricated and characterized. An ultralow dark current density of 16.3 mA/cm2 at -1 V was achieved as expected due to the low threading dislocation density (TDD) in pseudomorphic GeSn layer. Owing to the ultralow dark current density and high responsivity of 0.307 A/W, a high specific detectivity of 1.37×1010 cm·Hz1/2/W was accomplished at 1,550 nm, which is comparable with commercial Ge and extended-InGaAs photodetectors. Meanwhile, the bias voltage-dependent photo response was investigated from 1,700 to 2,200 nm. The extracted effective absorption coefficient of GeSn/Ge MQW shows a QCSE behavior with electric field-dependent exciton peaks from 0.688 to 0.690 eV. An absorption ratio of 1.81 under -2 V was achieved at 2 μm, which shows early promise for effective optical modulation. The high frequency response was calculated theoretically, and the predicted 3-dB bandwidth for the photodiode with a mesa diameter of 30 μm could reach 12 GHz at -2 V. Ministry of Education (MOE) National Research Foundation (NRF) Published version National Research Foundation Singapore (NRF–CRP19–2017–01); Ministry of Education - Singapore (R-263-000-D45-112); Ministry of Education - Singapore (R-263-000-C58-133). 2020-11-03T01:13:02Z 2020-11-03T01:13:02Z 2020 Journal Article Zhou, H., Xu, S., Wu, S., Huang, Y.-C., Zhao, P., Tong, J., ... Tan, C. S. (2020). Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate. Optics Express, 28(23), 34772-34786. doi:10.1364/OE.409944 1094-4087 https://hdl.handle.net/10356/144386 10.1364/OE.409944 23 28 34772 34786 en NRF– CRP19–2017–01 Optics Express © 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement. application/pdf |
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Engineering::Electrical and electronic engineering::Semiconductors Germanium-Tin Photodetector Zhou, Hao Xu, Shengqiang Wu, Shaoteng Huang, Yi-Chiau Zhao, Peng Tong, Jinchao Son, Bongkwon Guo, Xin Zhang, Dao Hua Gong, Xiao Tan, Chuan Seng Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
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A GeSn/Ge multiple-quantum-well (MQW) p-i-n photodiode structure was proposed for simultaneously realizing high detectivity photo detection with low dark current and effective optical modulation based on the quantum confined Stark (QCSE) effect. The MQW stacks were grown on a 300-mm Ge-buffered Si substrate using reduced pressure chemical vapor deposition (RPCVD). GeSn/Ge MQW p-i-n photodiodes with varying mesa diameters were fabricated and characterized. An ultralow dark current density of 16.3 mA/cm2 at -1 V was achieved as expected due to the low threading dislocation density (TDD) in pseudomorphic GeSn layer. Owing to the ultralow dark current density and high responsivity of 0.307 A/W, a high specific detectivity of 1.37×1010 cm·Hz1/2/W was accomplished at 1,550 nm, which is comparable with commercial Ge and extended-InGaAs photodetectors. Meanwhile, the bias voltage-dependent photo response was investigated from 1,700 to 2,200 nm. The extracted effective absorption coefficient of GeSn/Ge MQW shows a QCSE behavior with electric field-dependent exciton peaks from 0.688 to 0.690 eV. An absorption ratio of 1.81 under -2 V was achieved at 2 μm, which shows early promise for effective optical modulation. The high frequency response was calculated theoretically, and the predicted 3-dB bandwidth for the photodiode with a mesa diameter of 30 μm could reach 12 GHz at -2 V. |
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School of Electrical and Electronic Engineering |
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School of Electrical and Electronic Engineering Zhou, Hao Xu, Shengqiang Wu, Shaoteng Huang, Yi-Chiau Zhao, Peng Tong, Jinchao Son, Bongkwon Guo, Xin Zhang, Dao Hua Gong, Xiao Tan, Chuan Seng |
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Article |
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Zhou, Hao Xu, Shengqiang Wu, Shaoteng Huang, Yi-Chiau Zhao, Peng Tong, Jinchao Son, Bongkwon Guo, Xin Zhang, Dao Hua Gong, Xiao Tan, Chuan Seng |
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Zhou, Hao |
title |
Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
title_short |
Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
title_full |
Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
title_fullStr |
Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
title_full_unstemmed |
Photo detection and modulation from 1,550 to 2,000 nm realized by GeSn/Ge multiple-quantum-well photodiode on 300-mm Si substrate |
title_sort |
photo detection and modulation from 1,550 to 2,000 nm realized by gesn/ge multiple-quantum-well photodiode on 300-mm si substrate |
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2020 |
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https://hdl.handle.net/10356/144386 |
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1688665480551727104 |