Chemical mechanical polishing of germanium selectively grown on silicon

• المؤلف الرئيسي: Tan, Bryan Yue Han
• مؤلفون آخرون: Tan Chuan Seng
• التنسيق: Final Year Project
• اللغة: English
• منشور في: Nanyang Technological University 2023
• الموضوعات: Engineering::Electrical and electronic engineering::Nanoelectronics; Engineering::Materials::Microelectronics and semiconductor materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/167639

This report reviews the importance of the Chemical and Mechanical Planarization (CMP) process for photonics applications and discusses the various factors that affect the quality of CMP, and how to achieve optimality of the slurry recipe. Germanium-on-silicon (GOS) waveguides are fabricated for t...