Chemical mechanical polishing of germanium selectively grown on silicon

• Main Author: Tan, Bryan Yue Han
• Other Authors: Tan Chuan Seng
• Format: Final Year Project
• Language: English
• Published: Nanyang Technological University 2023
• Subjects: Engineering::Electrical and electronic engineering::Nanoelectronics; Engineering::Materials::Microelectronics and semiconductor materials
• Online Access: https://hdl.handle.net/10356/167639
• Institution: Nanyang Technological University

This report reviews the importance of the Chemical and Mechanical Planarization (CMP) process for photonics applications and discusses the various factors that affect the quality of CMP, and how to achieve optimality of the slurry recipe. Germanium-on-silicon (GOS) waveguides are fabricated for t...