Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD

Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD

In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.

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Bibliographic Details
Main Author: Cui, Jie.
Other Authors: Rusli
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:http://hdl.handle.net/10356/4193
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Institution: Nanyang Technological University
Description
Summary:In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.

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