Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD

• Main Author: Cui, Jie.
• Other Authors: Rusli
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
• Online Access: http://hdl.handle.net/10356/4193
• Institution: Nanyang Technological University

In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.